ASM America

Electroglas 2001 Automatic Wafer Probe Configured for 6″ wafers Viision Module PRM-2 Power Control PPC Controller RMHM2 Forcer X/Y motor & platen ring carrier microscope

Matrix 105 CD System One Plasma Asher Configured for 6″ wafers capable of 2″ to 6″ alluminum heated wafer chuck 35 WPH on 6″ substrates

Ultratech 1500 Stepper Step, Align & Expose Configured for 6″ wafers capable of 3″ to 8″ large exposure field 944 servo baords auto pre-alignment cassette

SVG Photoresist 8826 Series Positive Developer Configured for 6″ wafers, cassette to cassett 2 Develop excludes pumps Quantity: 2 | Wafer Size: 6″ | Location: Rosnov,

SVG Photoresist 8826 Series Negative Developer Configured for 6″ wafers, cassette to cassett 2 Develop excludes pumps Quantity: 2 | Wafer Size: 6″ | Location: Rosnov,

SVG Photoresist 8826 Series Coater Configured for 6″ wafers, cassette to cassett 2 coat, excludes pumps Quantity: 2 | Wafer Size: 6″ | Location: Rosnov, CZ